Top 550+ Solved Unconventional Machine Process (UMP) MCQ Questions Answer
Q. Pre cleaning is done on the work piece surface in order to achieve, which of the following factors?
a. to provide good adhesion
b. to provide clean surface
c. to assure the absence of contaminants
d. all of the mentioned
Q. Special coatings applied on work piece materials in order to protect them from chemical reaction are known as
a. maskants
b. protective coverings
c. protective varnishing
d. none of the mentioned
Q. Type of mask depends on which of the factor/s, given below?
a. size of work piece
b. number of parts
c. desired resolution
d. all of the mentioned
Q. During Chemical milling, depth of etch is controlled by which factor of immersion?
a. time
b. mask method
c. mask area
d. none of the mentioned
Q. In Chemical milling, excessive flow of chemical reagent results in which of the following defects?
a. channellings
b. grooves
c. ridges
d. all of the mentioned
Q. Of the following, which ratio defines the etch factor?
a. etching depth to undercut
b. undercut to etching depth
c. undercut to mask area
d. mask area to undercut
Q. CHM cannot eliminate which of the following defects?
a. irregularities and dents
b. surface scratches
c. waviness
d. all of the mentioned
Q. Which of the following are the tools required for Chemical milling?
a. maskants
b. etchants
c. scribing plates
d. all of the mentioned
Q. Which of the following are the materials used for making maskants?
a. synthetic materials
b. rubber materials
c. polymeric materials
d. all of the mentioned
Q. What are the properties that a maskant used in Chemical milling should possess?
a. be tough and adhere well
b. scribe easily
c. be inert to chemical reagent
d. all of the mentioned
Q. Which of the following can be used to apply the maskants on work piece in Chemical milling?
a. dipping or spraying
b. rolling or electro coating
c. adhesive tapes
d. all of the mentioned
Q. In maskant application, photo-resist masks ensure which of the following advantages?
a. high accuracy
b. ease of repetition
c. ease of modification
d. all of the mentioned