Q. is the stimulation of oxide formation by means of non-isothermal plasma maintained at low pressure in a microwave cavity surrounding the tube. (Solved)
1. outside vapor phase oxidation (ovpo)
2. vapor axial deposition (vad)
3. modified chemical vapor deposition (mcvd)
4. plasma-activated chemical vapor deposition (pcvd)
- d. plasma-activated chemical vapor deposition (pcvd)